发明名称 MANUFACTURE OF NEGATIVE TYPE RELIEF COPY
摘要 A process in which a photosensitive material containing an ester or an amide of a 1,2-quinonediazidesulphonic or -carboxylic acid and a quaternary phosphonium compound as photosensitive compound is exposed through an image, then heated, exposed again over its entire surface after cooling and then developed with an aqueous alkaline developer. The process makes it possible to produce negative copies with a material which yields positive copies when processed normally.
申请公布号 JPS6197647(A) 申请公布日期 1986.05.16
申请号 JP19850227970 申请日期 1985.10.15
申请人 HOECHST AG 发明人 HANSU IERUKU FUORUMAN;PAURU SHIYUTAARUHOOFUEN
分类号 G03C1/00;G03C1/72;G03C5/00;G03F7/004;G03F7/022;G03F7/20;G03F7/26;G03F7/38 主分类号 G03C1/00
代理机构 代理人
主权项
地址