| 摘要 |
Uniform illumination of a two dimensional area, such as a lithographic mask, is provided. The fan-like input beam (50) is sent to a mirror (52), which it strikes at a grazing angle and is then reflected to the area to be illuminated. Collimation occurs to reduce the divergence of the beam in order to increase its intensity. By changing the grazing angle between the reflected beam (50) and the mirror (52) by a small amount, the reflected beam (54) will be swept across the two dimensional area. The angle is changed at a non-uniform rate which is a function of time, and is chosen so that substantially uniform illumination occurs at all points in the area to be illuminated. A particular embodiment uses a divergent x-ray beam from a synchrotron source. The divergent beam strikes a cylindrical mirror, which collimates it and directs the reflected beam to an x-ray mask plane. The mirror is moved with a nonlinear velocity in order to provide substantially uniform illumination of the mask area, and substantially uniform heating across the mask plane. |
