| 摘要 |
PURPOSE:To permit easy dry etching, to improve the adhesiveness to a transparent substrate and to obtain high reliability by providing a metallic film converted to silicide on the transparent substrate and disposing further a low reflecting film thereon. CONSTITUTION:The metallic film 3 converted to silicide and the low reflecting film 4 are successively laminated and disposed on the transparent substrate 1. A quartz glass substrate is preferably used for the substrate 1, a transition metal for the film 3 and a metallic oxide film for the film 4. The film 3 and film 4 formed in the above-mentioned manner permit easy dry etching and since the film 3 has the good adhesiveness to the substrate 1, the fine pattern is hardly strippable in the stage of cleaning the mask. The etching speed is thus increased and the photomask material having excellent reliability is obtd. |
