发明名称 LIQUID PHASE EPITAXIAL GROWTH METHOD
摘要 <p>LIQUID PHASE EPITAXIAL GROWTH METHOD In liquid phase epitaxial growth of a compound semiconductor layer on a substrate, an unsaturated solution is brought into contact with a solute source crystalline plate. The plate dissolves into the solution, which creates a supercooling condition in the solution without decrease of the solution temperature. The crystalline plate has a denser crystal face than that of the substrate, and/or the lattice constant of the crystalline plate is considerably different from that of the substrate.</p>
申请公布号 CA1204526(A) 申请公布日期 1986.05.13
申请号 CA19830426610 申请日期 1983.04.25
申请人 FUJITSU LIMITED 发明人
分类号 C30B19/12;C30B19/04;C30B29/40;H01L21/02 主分类号 C30B19/12
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