发明名称 |
Process for the photochemical vapor deposition of aromatic polymers |
摘要 |
A low-temperature process for forming a thin film of an aromatic polymer on the surface of a substrate by exposing the substrate to a monomer precursor containing arylene groups in the presence of radiation of a selected wavelength. Upon radiation inducement, the monomer units interact to form a polymer comprising directly bonded repeating arylene groups, and the polymer deposits as a layer on the substrate. Optionally, the polymer layer may be simultaneously or subsequently doped to provide a conductive polymer layer. Specifically disclosed polymers are polyparaphenylene and its antimony pentafluoride-doped derivative. The former is useful as a dielectric insulator or passivation material in semiconductor devices and circuits, while the latter is useful in batteries and solar cells, or electromagnetic shielding.
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申请公布号 |
US4588609(A) |
申请公布日期 |
1986.05.13 |
申请号 |
US19840674619 |
申请日期 |
1984.11.26 |
申请人 |
LEYDEN, RICHARD N.;HALL, JAMES T. |
发明人 |
LEYDEN, RICHARD N.;HALL, JAMES T. |
分类号 |
H01B5/14;B05D3/06;B05D7/24;C08G61/00;C08G61/02;H01B13/00;H01B17/60;H01B17/62;H01B19/00;H01L21/312;(IPC1-7):B05D3/06 |
主分类号 |
H01B5/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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