发明名称 Process for the photochemical vapor deposition of aromatic polymers
摘要 A low-temperature process for forming a thin film of an aromatic polymer on the surface of a substrate by exposing the substrate to a monomer precursor containing arylene groups in the presence of radiation of a selected wavelength. Upon radiation inducement, the monomer units interact to form a polymer comprising directly bonded repeating arylene groups, and the polymer deposits as a layer on the substrate. Optionally, the polymer layer may be simultaneously or subsequently doped to provide a conductive polymer layer. Specifically disclosed polymers are polyparaphenylene and its antimony pentafluoride-doped derivative. The former is useful as a dielectric insulator or passivation material in semiconductor devices and circuits, while the latter is useful in batteries and solar cells, or electromagnetic shielding.
申请公布号 US4588609(A) 申请公布日期 1986.05.13
申请号 US19840674619 申请日期 1984.11.26
申请人 LEYDEN, RICHARD N.;HALL, JAMES T. 发明人 LEYDEN, RICHARD N.;HALL, JAMES T.
分类号 H01B5/14;B05D3/06;B05D7/24;C08G61/00;C08G61/02;H01B13/00;H01B17/60;H01B17/62;H01B19/00;H01L21/312;(IPC1-7):B05D3/06 主分类号 H01B5/14
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