| 摘要 |
PURPOSE:To form a membrane at a high speed while uniformity is held, by allowing reaction luminous flux to be incident to a substrate in parallel and passing said incident luminous flux along the substrate to be reflected by a reflective mirror while allowing the reflected liminous flux to be again incident to said substrate in parallel. CONSTITUTION:A substrate support part 8 for supporting a substrate 7 is mounted in a reaction container 6 and the substrate 7 is placed on the substrate support part 8 and a substrate heating part 9 for heating the substrate 7 is provided to said support part 8. Further, a gaseous phase substance introducing pipe 10 for introducing a gaseous phase substance into the reaction container 6 is provided in the reaction container 6. In this apparatus, when luminous flux 1 is introduced into the reaction container 6 from the luminous flux introducing window 40 of a liminous flux introducing part 4, reaction luminous flux 1 passes in parallel to the substrate 7 to be guided to a luminous flux reflective part 11. The luminous flux 1 guided to the luminous flux reflective part 11 is reflected by a reaction luminous flux total reflection mirror 110 to be returned to the substrate 7. |
