| 摘要 |
PURPOSE:To easily switch a mask plate by providing plural masks for implantation region restriction whose hole sizes are different in an ion implanting device. CONSTITUTION:A mask plate 6 for a big aperture wafer and a mask plate 7 for a small aperture wafer are provided in a beam line of an ion implanting device. When a big aperture wafer is ion-implanted, a mask plate 7 is devided and moved in a lateral direction and placed in a position which does not interfere with an ion beam 1. Then the mask plates can be easily switched. As it is not necessary to break a vacuum in switching the mask plates, an unnecessary ion is not mixed-in. |
