| 摘要 |
PURPOSE:To prevent developing liquid shaked off from a rotating wafer to be dried from re-depositing onto the wafer, by providing with a plural of slant plates which enclose a spin chuck in a developing apparatus. CONSTITUTION:A semiconductor wafer 1 is mounted on a spin chuck 2 in a developing apparatus, and photo resist on the wafer 1 is developed by developing liquid sprayed from a developing nozzle. After finishing the developing, the wafer 1 as well as the spin chuck 2 is rotated 10 fast to shake off the developing liquid to dry the wafer 1. A plural of slant plates 8 which enclose the spin shuck 2 are mounted to the upper cap of the developing cup. In this way, the developing liquid shaked off from the wafer 1 due to the fast revolution 10 bumps against the slant plates 8 and flys away from the wafer 1 downward as shown in the loci 9. Thus it is prevented that the developing liquid may reflect at the inner wall of the cup 4 and may re-deposite onto the wafer 1. |
