发明名称 AUTOMATIC LAPPING SYSTEM OF WAFER LAPPING MACHINE
摘要 <p>PURPOSE:To improve the productivity and to maintain the high quality of products by changing the speeds of upper and lower surface plates and a carrier from high speed to low speed with abrasive grain slurry being supplied and by stopping the machining according to the out put signals from a constant dimension detector. CONSTITUTION:An upper surface plate 1 goes down from an upper limit position at a high speed and then at a low speed with the speed changed according to the signals detected by a position sensor 13 and is rotated with its hook 23 engaged with a drive shaft 7. Then timing, when the upper surface plate 1 going down at a low speed is brought into contact with an wafer 4, is detected by the sequencer of a controlling section supplying abrasive grain slurry between the upper surface plate 1 and a lower surface plate 2 through a ring shaped path 17. Drive shafts 7-10 are rotated at a low speed to rotate the upper surface plate 1 and the lower surface plate 2 and a carrier 3 at a low speed. With drawing to the time of a counter pressure timer the rotary speeds of the drive shaft 7-10 vary to high speed until the counter pressure timer is turned off, and consequently the surface plate 1 is lowered at a low speed to grind wafers 4... and stops the machining according to the out put signals from a constant dimension detector 15.</p>
申请公布号 JPS6190867(A) 申请公布日期 1986.05.09
申请号 JP19840209291 申请日期 1984.10.05
申请人 NAOETSU DENSHI KOGYO KK;SHINETSU ENG KK 发明人 YAMAGA KOJI;MIYASHITA TOSHIO;OGIWARA YUKIO;TAKEUCHI TOMOYUKI;TANAKA TAKESHI
分类号 B24B37/00;B24B37/013;B24B37/04;B24B37/08;H01L21/304 主分类号 B24B37/00
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