MECHANISM FOR WASHING EVAPORATION SURFACE IN CENTRIFUGAL TYPE THIN FILM VACUUM ENRICHING DEVICE

摘要

PURPOSE:To wash efficiency an evaporation surface while a vacuum vessel is held closed by injecting a washing liquid to the evaporation surface while rotating a rotor. CONSTITUTION:A washing liquid injection nozzle 14 is provided toward the evaporation surface 3 of the rotor 2 and while the rotor 2 is rotated, the washing liquid is injected toward the surface 3. The rotor 2 can be eventually rotated at an optional high speed and as a result the impact force of the washing liquid injected to the surface 3 against the surface 3 increases. Since the flow rate of the washing liquid flowing on the surface 3 increases, the washing effect is improved and the through washing of the surface 3 while a vacuum vessel 1 is held hermetically closed is made possible.