| 摘要 |
PURPOSE:To offer a liquid jet recording head of durable and high reliability, by a method wherein a passage of recording liquid is constituted by cured film of photosensitive resin with coefficient of linear expansion under 7.7X16<-6> cm/ca/ deg.C. CONSTITUTION:Desired numbers of liquid discharge energy generating bodies 2 are provided on a silicon substrate 1. A photosensitive resin film (photoresist) is laminated on a plate surface 1a. After a photomask 4 is stacked on the photoresist 3, the exposure is performed from the above, and it is dipped in a volatile organic solvent, and unpolymerized photoresist is dissolved and removed, then a cured photoresist film 3H is formed and further cured. A resist film 5H and a resist 8 are formed in the same method. When the liquid jet recording head is manufactured using photoresist cured film having coefficient of linear expansion under 7.7X10<-5>cm/cm/ deg.C the generation of the stress is seldom because the difference of the coefficient of linear expansion of the cured film and the substrate is not so large, the deformation of a discharging outlet or the liquid passage is kept minimum. |
