| 发明名称 |
POSITIVE TYPE, RADIATION-SENSITIVE ORGANIC POLYMER MATERIALS |
| 摘要 |
Aliphatic aldehyde polymer containing at least one Si atom in its molecular chain is a positive type resist having a very high sensitivity to radiation such as electron beams, X-rays, ion beams, etc. |
| 申请公布号 |
DE3362815(D1) |
申请公布日期 |
1986.05.07 |
| 申请号 |
DE19833362815 |
申请日期 |
1983.11.10 |
| 申请人 |
HITACHI, LTD. |
发明人 |
NATE, KAZUO;INOUE, TAKASHI;YOKONO, HITOSHI |
| 分类号 |
G03F7/004;C08G2/14;C08G2/20;G03C1/72;G03F7/039;G03F7/075;H01L21/027;(IPC1-7):G03F7/10 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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