发明名称 |
MATERIAL FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE AND ITS MANUFACTURE |
摘要 |
PURPOSE:To manufacture the titled lightweight material having superior machinability and a satisfactory heat radiating property by solidifying a molten Al alloy having a specified composition contg. a large amount of Si at a very high cooling rate by an atomizing method to obtain alloy powder and by subjecting the powder to hot plastic working. CONSTITUTION:A molten Al alloy consisting of 30-50wt% Si and the balance Al is solidified at >=10<2> deg.K/sec average cooling rate by an atomizing method to obtain alloy powder of <=42 mesh size. The powder is subjected to hot plastic working. An Al alloy material for a substrate for a semiconductor device contg. proeutectic Si of <=50mum size and having <=18X10<-6>/ deg.C coefft. of thermal expansion is obtd.
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申请公布号 |
JPS6187843(A) |
申请公布日期 |
1986.05.06 |
申请号 |
JP19840208471 |
申请日期 |
1984.10.03 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
KUROISHI ATSUSHI;AKECHI KIYOAKI;ITO YOSHIAKI;KOTANI YUSUKE |
分类号 |
C22C21/00;C22C1/04;C22C21/02;H01L21/52;H01L21/58;(IPC1-7):C22C21/02 |
主分类号 |
C22C21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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