| 摘要 |
PURPOSE:To attain surface analysis having high resolution and determination by comparing analytical data of an X-ray microanalyzer obtained before and after etching based upon ion impact on the surface of a sample. CONSTITUTION:A sample 3 of which surface is not removed is analyzed by the X-ray microanalyzer, its data are stored in a processing circuit 10 and the surface of the sample 3 is etched by an ion gun 4 to remove the surface. The surface-removed sample is also analyzed by the X-ray microanalyzer and the analyzed data are subtracted from the data obtained before etching by the processing circuit 10. When a positive peak is generated as the result of said subtraction, the peak indicates elements existing in the surface layer and a '0' or negative peak indicates elements existing in both the surface layer and ground. |
