发明名称 Electrode structure for a semiconductor devices
摘要 An electrode structure for use in semiconductor devices comprising: a semiconductive layer; a conductive layer disposed on one surface of the semiconductive layer; first regions which intervene between the layers and serve as passages for transmitting minority carriers from the semiconductive layer to said conductive layer; and second regions which intervene between said layers and serve as passages for conveying majority carriers between the semiconductive layer and conductive layer, the first and second regions being selectively formed on the semiconductive layer so as to be adjacent to one another.
申请公布号 US4587547(A) 申请公布日期 1986.05.06
申请号 US19830512942 申请日期 1983.07.12
申请人 NIPPON TELEGRAPH & TELEPHONE PUBLIC CORP. 发明人 AMEMIYA, YOSHIHITO;SUGETA, TAKAYUKI;MIZUSHIMA, YOSHIHIKO
分类号 H01L23/482;H01L29/08;H01L29/45;H01L29/47;H01L29/861;H01L29/868;(IPC1-7):H01L29/04;H01L29/06;H01L29/46;H01L29/91 主分类号 H01L23/482
代理机构 代理人
主权项
地址