发明名称 ELECTRON BEAM EXPOSURE APPARATUS
摘要 PURPOSE:To realize drawing of fine pattern by measuring nonlinear distortion of deflection voltage waveform, calculating a distortion correcting value from this value, mixing a distortion correcting signal with a deflection signal having nonlinear distortion and forming a deflection signal having good linearity. CONSTITUTION:When a signal VS which attenuates a deflection signal VSout in synchronization with a synchronous signal Scnt rises linearly, the time until it becomes equal to the reference voltage Vref output from a computer 20 is measured. The distortion of waveform of deflection voltage VSout is measured 19 by measuring 23 a count time for each rise like a step from the minimum voltage VL to the maximum voltage VH. Based on this calculated value, the computer 20 reverses the polarity of reference value to generate a corrected value in proportional to a deviation. The computer 20 moreover stores 27 a corrected value using a digital value at the timing where the measuring time is divided into n-point, reads 28 such value through control with the synchronous signal Scnt and converts it into analog signal through the D/A converter in order to generate a corrected signal VSb. This signal is then mixed with a deflection signal VSa. Thereby, a deflection signal having good linearity can be obtained.
申请公布号 JPS6188524(A) 申请公布日期 1986.05.06
申请号 JP19840209495 申请日期 1984.10.05
申请人 TOSHIBA CORP 发明人 WATANABE TOMOHIDE
分类号 H01L21/027;H01L21/30;(IPC1-7):H01L21/30 主分类号 H01L21/027
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