发明名称 |
Mask element for selective sandblasting and a method |
摘要 |
A mask element for selective sandblasting comprising a support film layer and, superimposed thereon in the following order, a retainer film layer of a water-insoluble cellulose derivative and a photoresist layer of a pattern mask, said photoresist layer of pattern mask being adapted to adhere to the surface of an article body to be engraved with a strength such that the mask is not detached therefrom during sandblasting. By the use of the mask element of the present invention, a pattern exactly corresponding to that of the mask, even if it is very fine, can be engraved on an article body nicely.
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申请公布号 |
US4587186(A) |
申请公布日期 |
1986.05.06 |
申请号 |
US19840601825 |
申请日期 |
1984.04.19 |
申请人 |
ASAHI KASEI KOGYO KABUSHIKI KAISHA |
发明人 |
NAKAMURA, SHOHEI;TUJI, YOSHIMASA |
分类号 |
B24C1/04;G03F7/00;G03F7/12;H05K3/00;(IPC1-7):B24B1/00;G03C11/12;G03C1/80;G03C1/70 |
主分类号 |
B24C1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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