| 摘要 |
A non-volatile memory cell of the MNOS type, in which the sidewalk effect is avoided or at least considerably reduced by limiting the extension of the boundary layer, in which charge is stored, to a region which is smaller than the thin gate dielectric covered by the gate electrode. The gate electrode extends from the active region over a thin insulator, in which no charge storage takes place, to above the thicker field insulation.
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