发明名称 REACTION APPARATUS
摘要 PURPOSE:To prevent a reaction gas inlet from being damaged resulting in gas leakage due to a crack in case of cleaning by a method wherein a ring with a through hole communicating and connecting with the end of a reacting tube as well as a path going through outside from the through hole is provided. CONSTITUTION:A fixing ring 13 is fixed on a substrate 11 provided with a hole to put in and out aquartz glass made reacting tube 12 by means of a screw 16. The fixing ring 13 is formed into a through hole almost opposite to the substrate 11 as well as into a step part to mount the reacting tube 12 on the opposite side from the substrate 11 while a reaction gas inlet 16 is formed on the periphery. A gas path 17 communicating with the inlet 16 advances firstly toward central part in the radial direction and then goes through toward the opposite side from the substrate 11 in the axial direction. Another gas path 22 communicating with the gas path 17 of fixing ring 13 formed in a connecting ring 21 is composed of a part passing through in the axial direction and another part communicated with the former part going through toward central part in the radial direction.
申请公布号 JPS6127624(A) 申请公布日期 1986.02.07
申请号 JP19850126005 申请日期 1985.06.12
申请人 HITACHI LTD 发明人 AKIBA MASAKUNI
分类号 H01L21/205;C23C14/56;C23C16/44;H01L21/22;H01L21/31 主分类号 H01L21/205
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