| 摘要 |
PURPOSE:To carry out an analysis, reducing the irradiation of electron beam in an unfavorable region by two-dimensionally scanning the electron beam on a specimen, and comparing a secondary electron signal generated with a reference value to switch an amount of the electron beam to be irradiated on the specimen. CONSTITUTION:An electron beam 2 is focused by a focusing lens 3, and it is thinly diaphragmed by an objective lens 4 to make incidence on a specimen 5, and it is two-dimensionally scanned on the specimen 5 by the movement of X, Y directions of a stage 6. And secondary electrons generated are detected by detectors 13a, 13b, and they are given to a CPU8 through an adding circuit 15 and a AD converter 16, and they are compared with the reference value from a key board 23 to control the power source 10 of the focusing lens, and an amount of the electron beam to be irradiated on the specimen 5 is switched to display the information of analysis on a printer 22 etc. Accordingly, it is possible to efficiently analyze a granular specimen etc. which is embedded into a resin by irradiating only a small amount of the electron beam on a region where the irradiation is unfavorable. |
