发明名称 SEMICONDUCTOR WAFER SURFACE ANALYZER
摘要 PURPOSE:To enable Raman spectral analysis of ultrafine adhesive without varying an object to be analyzed rapidly by driving a wafer positioning mechanism on the basis of position information stored in a memory, and providing means for deciding the adhesive for the second optical path. CONSTITUTION:When a wafer positioning mechanism 5 is driven to move a wafer 4 to the position opposed to a notch 27 of an integrating bulb 26, a laser light C emitted from a light incident port 28 into the bulb 26 by reflecting on a mirror 25 can be emitted to the surface of the wafer 4. If fine defects or fine adhesive exists on the surface of the wafer 4, the light C is scattered, and the scattered light C' is detected by a photodetector 31. After a detection signal from the photodetector 31 is amplified and high frequency noise is removed byd a low pass filter 33, the signal is A/D-converted, and stored in a memory 35. Thus, after the fine adhesive is detected by a wafer surface inspecting unit 2, Raman spectral analysis can be performed without moving the wafer 4.
申请公布号 JPS6182442(A) 申请公布日期 1986.04.26
申请号 JP19840204827 申请日期 1984.09.29
申请人 TOSHIBA CORP 发明人 YOSHIDA TAKASHI
分类号 G01B11/30;H01L21/66;H01L21/67 主分类号 G01B11/30
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