| 摘要 |
PURPOSE:To form a high-precision gap by subjecting the second layer glass to heat treatment at a prescribed temperature for a prescribed time for the purpose of discharging Ax gotten between an SiO2 film and glass films before glass films after sputtering are joined to each other. CONSTITUTION:An SiO2 film 4 and a glass film 5 are formed successively on each of ferrite cores 11 and 12 by the magnetron sputtering method. The SiO2 film is formed with 8,000Angstrom thickness and the glass film is formed with 2,000Angstrom thickness in case of 2mu gap length. These ferrite cores 11 and 12 are butted, and a reinforcing glass 6 is set, an ferrite cores 11 and 12 are heated at 850 deg.C while being press-fitted, thereby forming the gap of a magnetic head. Thus, glasses different in viscosity are used, especially, a glass having a higher viscosity at the press-fitting heating temperature than the glass film 5 is used as he reinforcing glass 6 to suppress effectively the reaction of the glass in an apex part. |
