发明名称 PHOTOSETTING COMPOSITION
摘要 PURPOSE:A composition useful as a coating compound, ink, various surface coating materials, etc., forming a film of coating having improved white hiding power after curing, photo-setting in a short time, obtained by blending a photo- setting composition with a silicone compound in a specific ratio. CONSTITUTION:For example, 50-99wt% photo-setting composition obtained by blending a photo-setting resin of epoxy acrylate, acrylic acid, etc. with a sensitizer such as a benzophenone compound, etc. is mixed with 1-50wt% silicone compound [e.g., methylmethoxysilane, N,N'-bis(trimethylsilyl)urea, methylsilicone oil, etc.]. USE:The titled compound is irradiated usually with ultraviolet rays at 180-700nm for about 1 second-10 minutes to give a cured material.
申请公布号 JPS6181402(A) 申请公布日期 1986.04.25
申请号 JP19840201513 申请日期 1984.09.28
申请人 TOSHIBA CORP 发明人 WADA HIROSUKE
分类号 C08F2/00;C08F2/44;C08F2/48;C08F2/50;C08K5/54;C08L33/00;C08L33/02;C08L67/00;C08L83/04;C08L101/00;C09D4/00;C09D5/00 主分类号 C08F2/00
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