| 摘要 |
PURPOSE:To purify the surface of target for stable irradiation of X-ray by forming a film of the same material as the target with vacuum deposition on the surface of said target where X-ray is generated with irradiation of electron beam. CONSTITUTION:Electron beam is generated from an electron beam generating apparatus 11 and is projected to a target 12. The target is rotated by a rotating axis 13 so that it is not overheated. An electron beam vacuum deposition apparatus 15 for vacuum deposition of aluminum to the surface of target is provided closely to the target 12. A vacuum deposition crucible 17 is filled with aluminum 20 which is the vacuum deposition source and vacuum deposition is carried out by electron beam emitted from an electron gun 18. Since an aluminum film 19 is always newly formed at the surface of target 12, the X-ray is generated normally. |
