| 摘要 |
PURPOSE:To improve the corrosion resistance of the titled medium by forming at least one layer of a film consisting of carbide and nitride on a substrate. CONSTITUTION:Glass, plastics such as polymethyl methacrylate resin and polycarbonate resin, and metals such as aluminum are used for a substrate 1, and a pregroup can be previously formed. A recording layer of GdTbFe, etc. is formed on the substrate 1 by sputtering, etc., and then a film consisting of carbide and nitride is formed by sputtering, etc. Concretely, the film consisting of carbide and nitride, for example, can be obtained by arranging Si on an SiC thin film and forming a film consisting of SiC and Si4N4 with use of Ar and N2 as a sputtering gas, or the film can be formed by sputtering simultaneously SiC as the first target and Si3N4 as the second target. By such a method, the film, having 50-10,000 Angstrom thickness, preferably 200-3,000 Angstrom , is preferably formed. |
