发明名称 SEMICONDUCTOR MEMORY
摘要 PURPOSE:To reduce pattern dependence on the reading of a memory for forming a plurality of first aluminum reinforcing wires along the direction of a word line as the longitudinal direction of a memory cell plate. CONSTITUTION:A capacitance electrode 3 is shaped on the whole memory cell array on a field insulating film 18, and an aluminum reinforcing wire 5 is connected to the capacitance electrode 3 through contact holes formed at regular intervals at the end sections of a memory cell array. The reinforcing wire consists of the same aluminum layer as a word line WL, and extends in parallel with the word line WL. A reinforcing wire 6 is composed of the same aluminum layer as a data line DL, and extends in parallel with the data line DL. Since no memory cell is shaped and there is the field insulating film 18 in a region to which the reinforcing wire 6 is formed, a memory cell capable of connecting to the same data line is isolated at the center, and connected to different data lines 171, 172. A memory cell plate 10 is connected so that potential difference is minimized by the aluminum reinforcing wires, thus reducing a time constant to pattern dependence.
申请公布号 JPS6178156(A) 申请公布日期 1986.04.21
申请号 JP19840199555 申请日期 1984.09.26
申请人 HITACHI LTD 发明人 KUNIYOSHI NOBUKO;YANAGISAWA KAZUMASA
分类号 H01L27/10;G11C11/401;H01L21/3205;H01L21/82;H01L21/8242;H01L23/52;H01L27/108 主分类号 H01L27/10
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