| 摘要 |
PURPOSE:To provide the title micropattern with high accuracy and productivity by a method wherein a mask pattern with transparent slits is arranged in a laser beam irradiating channel while the laser beams passing through the slits of mask pattern are focus-projected on an objective item through the intermediary of a reduction-optical system. CONSTITUTION:Laser beams 17 oscillated from a laser oscillator 16 with beam diameter thereof expanded by a collimater lens 18 into parallel beams 19 are projected on a mask pattern 20. The laser beams 17 passing through the mask pattern 20 engraved with slits 21 of specified figure are focussed by reduction- projecting lenses 22a, 22b to reduce the mask pattern 20 to specified scale for projecting it on a photoresist film 2 on a substrate 1. Through these procedures, the figure printing time may be shortened by means of reduction-projecting the figure of mask pattern while the mask pattern accuracy may be improved remarkably since the applicable lenses 22a, 22b are highly precise as well as the applicable laser oscillator 16 is highly stable. |
