发明名称 ELECTRON BEAM PROBING SYSTEM
摘要 PURPOSE:To curtail the inspection time by aligning a desired inspection sample with the optical axis of electron beam within very narrow sight. CONSTITUTION:An instruction for lighting light emitting diodes 21 corresponding to an inspection sample 31 is issued, and a controller 9 moves an X-Y stage 6 while the feedback in the X, Y directions is applied to the X-Y stage driver 61 so that outputs of a photodetectors 81 and 83 become equal and outputs of photodetectors 82, 84 become equal. When the X-Y stage 6 is moved so that the light emitting diode 21 comes on the center line of optical axis 71 of electron beam irradiation source 7. Moreover, since positional relation with light emitting diode 21 is previously known, the desired inspection point can be aligned with the optical axis 71 of electron beam irradiation source 7 by moving the X-Y stage 6 up to the measuring position of inspection sample 31 in the X, Y directions.
申请公布号 JPS6175537(A) 申请公布日期 1986.04.17
申请号 JP19840198174 申请日期 1984.09.20
申请人 FUJITSU LTD 发明人 GOTO YOSHIAKI;OZAKI KAZUYUKI;ISHIZUKA TOSHIHIRO;ITO AKIO;OKUBO KAZUO;KAWABATA MASAAKI
分类号 H01L21/68;G01R31/302;H01L21/66;H01L21/67 主分类号 H01L21/68
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