发明名称 2-AXIS OSCILLATING X RAYS STRESS MEASURING APPARATUS
摘要 PURPOSE:To achive an accurate measurement even for material with a large crystal particle or having a texture, by providing a means of rotating an X rays tube and a detector about the incident point of X rays into the material and a means for rotatively oscillating them centered on two straight lines passing through the incident point. CONSTITUTION:To determine the angle of diffraction with respect to the inci dent angle of X rays when X rays are irradiated at the fixed point 4 of the surface of material 3 from an X rays tube 1, a motor 6 is driven with a control ler 2 to scan angles between emitted X rays detected and incident X rays. The scanning shall be performed by steps at each fixed fine angle from the initial position to integrate an output from a detector 2 within a controller 12 for a fixed time whereby a value having the same meaning as the mean. Moreover, a support member 5 is moved cyclically along a support means 7 with a motor 8 at each measuring step while the member 5 is moved cyclically at the right angle to the member 7, so to speak, the detector 2, the X rays tube 1 and the member 5 are being oscillated, to determine the equivalence of the mean to define the angle at its maximum as the angle between the inci dent and emission X rays.
申请公布号 JPS6175243(A) 申请公布日期 1986.04.17
申请号 JP19840197713 申请日期 1984.09.19
申请人 SHIMADZU CORP 发明人 KIRIYAMA SADAO;ENAMI HIROSHI;SEKIGUCHI HARUO
分类号 G01L1/00;G01L1/25;G01N23/207 主分类号 G01L1/00
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