| 发明名称 |
Process for preparing a titanium carbide film |
| 摘要 |
A process for preparing a titanium carbide film characterized by vaporizing metallic titanium from a metallic titanium vaporizing source placed in an atmosphere containing a dilute acetylene gas and depositing titanium carbide onto the surface of base set up facing said source.
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| 申请公布号 |
US4582728(A) |
申请公布日期 |
1986.04.15 |
| 申请号 |
US19830523440 |
申请日期 |
1983.08.16 |
| 申请人 |
JAPAN ATOMIC ENERGY RESEARCH INSTITUTE |
发明人 |
ABE, TETSUYA;INAGAWA, KOUNOSUKE;OBARA, KENJIRO;MURAKAMI, YOSHIO |
| 分类号 |
C01B31/30;C23C14/00;C23C14/06;G21B1/11;G21B1/17;(IPC1-7):C01B31/30 |
主分类号 |
C01B31/30 |
| 代理机构 |
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