Electrophotographic element with amorphous Si(C) overlayer

摘要

An electrophotographic photosensitive material comprising an electrically conductive support and a photoconductive layer of amorphous silicon containing a silicon atom and a hydrogen atom and/or a halogen atom provided said support, which comprises a low-photoconductive overcoat layer of amorphous silicon containing a carbon atom in a ratio of 5 to 35 atomic % on said photoconductive layer.