发明名称 Deflection system in an electron beam exposure device
摘要 In a D/A converter in a deflection system of an electron beam exposure device, the most significant bits (m bits) of input digital data consisting of n bits are input into a decoder circuit, and 2m D/A converters which correspond to the m bits are provided. The data consisting of the least significant bits (n-m bits) is input into the 2m D/A converters via 2m gates, respectively. The decoder circuit is constructed so as to control the 2m gates so that when the content of the data of the m bits is S, the first to S-th data of the 2m D/A converters is all rendered to be "1", the data of the (S+1)-th D/A converter remains the same as the data of the n-m bits, and the data of the (S+2)-th and subsequent D/A converters is all rendered to be "0", the sum of the outputs of the 2m D/A converters being applied to a coil which deflects the electron beam.
申请公布号 US4583077(A) 申请公布日期 1986.04.15
申请号 US19830536467 申请日期 1983.09.27
申请人 FUJITSU LIMITED 发明人 YASUDA, HIROSHI;TSUCHIKAWA, HARUO
分类号 H01J37/305;G03F7/20;H01L21/027;H01L21/30;H03M1/00;(IPC1-7):H03K13/05 主分类号 H01J37/305
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