| 摘要 |
PURPOSE:To provide the titled apparatus used in a semiconductive process generating no scattering of the molten lump of a processing material and enhancing marking quality, constituted by specially modulating laser beam by providing a mask having a plurality of specific opening parts in laser beam. CONSTITUTION:The titled optical system is constituted of a beam expander 8, a scanning optical system 9 forming a pattern and a processing lens 10 and the mask 8 has a plurality of circular opening parts 8a each having a size 1/20-1/5 the diameter of laser beam and the opening parts 8a are arranged so as to be symmetric or at random to an optical axis in 1/4 rotary symmetric arrangement. The mask 8 is provided to a processing surface in the vicinity of a galvano emitting port at a position forming beam intensity distribution corresponding to opening positions. Because a processing cross-section takes a shape showing a high beam scattering property wherein the pitch of the valley 12 and crest 12b of a bottom part is 5-50mum and a depth is 2,500Angstrom -1mum and marking easy to look a character is formed. |
