发明名称 JUDGING METHOD FOR PATTERN USED FOR PATTERN DEFECT INSPECTION SYSTEM
摘要 PURPOSE:To inspect defects of reticle masks having a large amount of patterns by utilizing an already existing control as it is and without changing the stage transfer speed, by a method wherein recording to the recording medium is carried out for every sub-region produced by dividing a unit region into a plurality, and scanning by stage transfer as sub-scanning is carried out through repetition by the number of sub-regions. CONSTITUTION:A PG tape prepared by the CAD system and the like is converted into an inspection reticle tape 31 having the format of this system and then supplied to a video conversion unit. The reticle tape 31 is installed to a tape unit 32, and then a place corresponding to a reticle mask 18 being inspected at the stage section 10 is read out of the reticle tape 31 via magnetic tape control part 36 by controlling a CPU in a control unit 40, and is memorized in one of two magnetic tape memories. After conversion from the group of dot coordinates obtained from the reticle tape 31 having memorized in the magnetic tape memory into images by means of a video signal conversion part 35 under the control of synchronized signals coming from the magnetic tape control part 36, the result is memorized in one of two video memories.
申请公布号 JPS6171630(A) 申请公布日期 1986.04.12
申请号 JP19840192701 申请日期 1984.09.17
申请人 NIPPON JIDO SEIGYO KK 发明人 UCHIYAMA YASUSHI;AWAMURA DAIKICHI
分类号 G01N21/88;G01N21/93;G01N21/956;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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