发明名称 ALIGNMENT PATTERN DETECTION OPTICAL SYSTEM OF PROJECTION TYPE EXPOSURE DEVICE
摘要 PURPOSE:To enable the yield of detection signals for alignment patterns of high contrast suitable for detecting the positions of alignment patterns,m by a method wherein a space filter is provided between an image of alignment pattern and a detecting element at a position unrelated to image formation with the alignment pattern. CONSTITUTION:A position 8 of Fourier transformation of an image of alignment pattern or a position 9 of image formation of the incidence iris 4 of a reducing projection lens 3 is preferable as the position of inserting the space filter. However, providing this filter within approx. 30% of the distance of an object lens 6 between the object image can produce almost the same effect as in the above case. As the space filter, a material resulting from evaporation of a non- transparent film such as the Cr film onto a glass substrate can be used, or a material such as the liquid crystal that can be locally controlled in permeability from outside can be used. On the other hand, as the illuminating light used for detection, a wide range of base color light can be utilized, and e.g. g-light or a laser light of similar wavelength can be also used.
申请公布号 JPS6171629(A) 申请公布日期 1986.04.12
申请号 JP19840192520 申请日期 1984.09.17
申请人 HITACHI LTD 发明人 NAKAJIMA NAOTO;OSHIDA YOSHISADA;NAKADA TOSHIHIKO
分类号 G03F9/00;H01L21/027;H01L21/30 主分类号 G03F9/00
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