| 摘要 |
PURPOSE:To obtain an apparatus suitable for subjecting a multiplicity of substrates to plasma discharge processing, by forming an electrode having outlets from a cylindrical porous plate and plates respectively closing two ends of the cylindrical plate, and providing a gas inlet in either one of the end plates. CONSTITUTION:An electrode 2 is formed in such a manner that a porous plate 6 made of Al is formed into an inverted frusto-conical shape having a taper on the order of 5 deg.C, and upper and lower ends thereof are respectively closed with Al end plates 7, 8, the upper end plate 7 being fixedly suspended through a support shaft 10 from a top panel 9 of a vacuum chamber 1. The upper end plate 7 of the electrode 2 is provided with a gas inlet 11 for introducing SiH4 gas, Ar gas or the like into a hollow part 2a. The material gas is introduced to the inlet 11 from the outside of the vacuum chamber 1 through a gas pipe 12 received inside the support shaft 10. The gas intro duced into the hollow part 2a is blown out to the surroundings through outlets defined by small bores 6a formed in the plate 6. A substrate holder 3 is formed from a swivel polygonal member 15 surrounding the cylindrical plate 6. Each of the sides 15a of the polygonal member 15 is provided with an angle of slightly outward inclination on the order of 5 deg.C similar to that of the plate 6. A substrate 5 is mounted on each side 15a. |
