| 摘要 |
PURPOSE:To inspect a patterns generator accurately omitting any expensive device by a method wherein reticles with exposed specific pattern columns are developed shorter than normal developing time to measure the gaps made between the resultant rectangular patterns. CONSTITUTION:Pattern columns composed of multiple cross in square type patterns comprising adjacent two lines and two columns of rectangular patterns are normally exposed by a pattern generator PG to be developed shorter than normal developing time for fixing process. At this time, gaps x, y are made between each rectangular patterns since respective rectangular patterns are fixed a little bit smaller than the normal dimensions of exposed rectangul patterns. Any distinct abnormality such as abnormally narrower gaps x, y detected by successive visual inspection through a microscope are measured to readjust PG by means of describing a characteristic drawing on the rectangu lar pattern's dimensions of s:x and s:y. In such a characteristic drawing, if aperture mask of PG is working accurately conforming to design data, the gaps x, y may be equivalent to specifics value A but if not, e.g. the aperture mask is exposed longer than the design data, the gaps x, y may fall below the value A. |
