发明名称 Shaped field magnetron electrode
摘要 A substrate support electrode for use in plasma processing equipment has a book-shaped prismatic body containing a magnet core with flange-like pole pieces at each end to provide a longitudinal magnetic field wrapped around the electrode body. An auxiliary field-shaping magnet spaced from a substrate support face of the electrode body, with each of its poles adjacent to the pole piece electrode body with each of its poles adjacent to the of like polarity of the electrode, flattens the magnetic field adjacent to the electrode support surface to produce a thin plasma of substantially uniform thickness close to the electrode surface.
申请公布号 US4581118(A) 申请公布日期 1986.04.08
申请号 US19830461022 申请日期 1983.01.26
申请人 MATERIALS RESEARCH CORPORATION 发明人 CLASS, WALTER H.;HURWITT, STEVEN D.;I, LIN
分类号 C23C14/36;C23C14/06;C23C14/34;C23C14/35;H01J37/34;H01L21/203;H01L21/31;(IPC1-7):C23C14/50 主分类号 C23C14/36
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