| 摘要 |
PURPOSE:To reduce heterogeneity and dispersion of a plasma treatment such as plasma etching by monitoring automatically a plasma luminous intensity. CONSTITUTION:Through an observation port provided in a plasma processing chamber 1, a plasma luminosity is received by a photo sensor 11, which incessantly measures a plasma luminous intensity. A luminous quantity which the photo sensor 11 detects is compared with a constant value and is output in the measuring portion 10. When a discharge becomes weaker than a constant value, an alarm is raised automatically and the first aid such that an output is strengthened according to that is planed to be given. |
