| 摘要 |
PURPOSE:To stabilize the quality by eliminating the variability in thickness of an oxide film by a method wherein a fixed amount of super pure water is reduced into vapor by means of ultrasonic waves, and this vapor is fed into a process tube with the carrier gas. CONSTITUTION:Super pure water controlled in flow rate with a microflowpump 6 is fed into an ultrasonic generator 5. The super pure water (c) is reduced into vapor by generating ultrasonic waves in the ultrasonic generator 5, and the vapor is transported into the process tube 1 with the carrier gas. In oxidation of wafers 4 in the process tube 1, water droplets generating by oversaturation are fed to the drain by opening and closing a valve 7. |
