发明名称 WAFER ATTRACTIVE DEVICE
摘要 PURPOSE:To prevent the generation of a flaw on a wafer due to its contact with a cutter and enable the exfoliating action to be given to the wafer closely attached to the cutter, by equipping a soft attractive pad and giving torque to the wafer in a direction it is detached from the cutter. CONSTITUTION:An attractive device 1 is gradually lifted by a lifting means 2 performing a follow-up motion to a rise of an ingot (a). And the attractive device 1, at least immediately before a wafer (b) is cut off, is extruded by the action of a laterally transferring cylinder 7 in the lifting means 2 to a position adjacent to the wafer (b), simultaneously applying air attracting action. In this way, an attractive pad 31, being curved due to its weak elasticity to a side of the wafer (b) by an attractive air stream generated in a clearance even if it is slightly provided for the wafer (b), closely attaches the whole peripheral surface to the wafer (b). Next the attractive pad 31, forming a flat shape as the vacuum pressure increases in a sucker 22, advances the sucker 22 against an urging means 28.
申请公布号 JPS6165748(A) 申请公布日期 1986.04.04
申请号 JP19840186166 申请日期 1984.09.04
申请人 OSAKA TITANIUM SEIZO KK;KYUSHU DENSHI KINZOKU KK;NIPPON SPINDLE MFG CO LTD 发明人 TOKURA SEITARO;NINOMIYA MASAHARU;ONISHI ISAO;KOSAKA TOSHIHIRO
分类号 B23Q7/04;B28D5/00 主分类号 B23Q7/04
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