发明名称 PATTERN EXPOSURE DEVICE
摘要 PURPOSE:To bake large screens without complicating and scaling up the titled device, by transcribing patterns are projected to the different regions of an exposed substrate by switching the light path with an optical axis shift means. CONSTITUTION:The patterns on a mask surface 1 illuminated by the illuminating light 6 are transcribed on a baked substrate 2 with an optical system 3. At this time, they are transcribed on the left half of the substrate 2 via reflection mirror 4. Baking is performed to the remaining half of the substrate 2 by changing the light path through the movement of the reflection mirror 4.
申请公布号 JPS6165431(A) 申请公布日期 1986.04.04
申请号 JP19840186467 申请日期 1984.09.07
申请人 CANON INC 发明人 SHINKAI HIROSHI
分类号 G03F7/20;H01L21/027;H01L21/30 主分类号 G03F7/20
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