| 摘要 |
PURPOSE:To hasten temperature fall speed at the time of furnace temperature fall in case of heat-treatment and to suppress dispersion of thickness of an oxide film and diffusive length on a surface of wafer by a method wherein a heat insulating section is constituted by the first heat insulating member located to innermost end, a cavity section where flows outside fluid and the second heat insulating member located to outermost end. CONSTITUTION:A heat insulating section 11 is constituted by the first heat insulating member 12 located to innermost end (to a heater 6), a cavity section 13 which flows outside fluid (e.g. air) and the second heat insulating member 14. The insulating section 11 is constituted b the first and the second heat insulating member 12, 14 and the cavity section 13 where an in-take valve 16 and an evacuation valve 17 mediate between 12 and 14. By this fact, the temperature fall speed at the time of forming the oxide film rise up remarkablly more than usual, so that dispersion of the oxide film thickness and the like can be prevented, and also the improvemet of productivit can be contrived. |
