| 摘要 |
Disclosed are compounds having the formula <IMAGE> wherein X is the residue of a benzoxazole radical; Y is carboxyl, alkoxycarbonyl, alkanoyl, cyano, carbamoyl, N-alkylcarbamoyl or N,N-dialkylcarbamoyl; and A is phenyl, naphthyl or phenyl or napthyl substituted with one or more substituents selected from hydroxy, halogen, alkyl, alkoxy, cycloalkyl, aryl, aryloxy or Y. Also disclosed are polymeric materials stabilized against degradation by ultraviolet light by the incorporation therein of one or more of the above-defined compounds.
|
