| 摘要 |
Compounds of the structure <IMAGE> and pharmaceutically acceptable salts thereof, wherein: R1 and R2 are independently H, OH, lower alkyl, lower alkoxy, aryloxy, heteroaryloxy, heteroaryl lower alkoxy, aryl, heteroaryl, aryl-lower alkyl, aryl-lower alkoxy, halogenated aryl-lower alkoxy, lower alkenyl, lower alkynyl, lower alkenoxy, lower alkynoxy, halogen or trifluoromethyl; A is H, aryl, lower alkyl, aryl-lower alkyl or heteroaryl; and B is <IMAGE> n=0-6, wherein D is H, CONR3R4, CO2H, CO2R5, CH2OH or CH2OR6, wherein R3, R4, R5 and R6 are independently H, lower alkyl, aryl, aryl-lower alkyl or heteroaryl; E is H, OH, lower alkyl, aryl or heteroaryl; and F is <IMAGE> wherein G is the same as R1 and R2, useful for the treatment of allergy, asthma and inflammatory conditions.
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