| 摘要 |
PURPOSE:To increase the energy of an electron beam, consisting of a charged particle beam, to 50keV or above and to reduce its beam resolving power to 0.2mum or below by a method wherein the multiple exposure of pattern having at least a part of a side in common is prevented. CONSTITUTION:A charged particle beam electronic exposure device is constituted in such a manner that the multiple exposure of the patterns, having at least a side in common partially can be provided. The charged particle ray is used as an electron beam, and its energy is increased to 50keV or above, not the accelerating voltage of 20keV. Also, beam resolving power is set at 0.2mum or below, and the converting time of data is reduced. |
