| 摘要 |
PURPOSE:To control the processing gas flowing into a processing chamber as well as to perform a processing at a constant speed by a method wherein a regulator, with which the current running to the electrode and the substrate located in a vacuum processing chamber, is provided and a flow-rate regulating valve is operated when the detected current value is increased or decreased from the preset current value. CONSTITUTION:The current running on a circuit 10 is detected by the current measuring instrument provided on the power source circuit 10 located between a vacuum processing chamber 1 and a power source 9, the current is converted into voltage, the voltage is amplified 15, the voltage signal of the detected current value and the preset current value is computed by an indicating controller 14, and the value of difference is sent to a controller 13 through the intermediary of an amplifier 16. Also, the processing speed such as the thin film forming speed and the like of the processing chamber 1 is converted to an exhaust speed by an exhaust pupe 6, and the flow-rate of the processing gas of an introducing pipe 5 is detected by a flow-rate sensor 20. Then, the current running on the electrode 7 and the substrate 8 of the processing chamber 1 is detected by a measuring instrument 11, the opening and closing of a flow-rate regulating valve 12 is controlled by a controller 13 based on the value corresponding to the difference between the detected current value calculating by the controller 14, and the processing speed in the processing chamber 1 is stabilized. |
