| 摘要 |
PURPOSE:To set the gap depth of the titled head to a proper value by forming a gap material thicker than gap length, etching the gap material, and after retreating an organic layer insulating film selectively, etching the gap material leaving film thickness corresponding to the gap length. CONSTITUTION:After forming a foundation insulating film 2 and a lower magnetic body 3 on a ceramic substrate 1, a gap material 4 thicker than specified gap length is formed by sputtering, etc. Further, a conductor coil 5 and an organic layer insulation film 6 are formed on the material 4, and lower end point A of a tapered part is determined. Then, the gap material 4 is etched by using the tapered organic layer insulating film 6 as a mask, and the film thickness to be etched is made to a thickness corresponding to the gap length. A lower end point B of tapered part is determined from the lower end point A of tapered part to the tip side of the head. Further, the organic layer insulating film 6 is etched selectively, and the lower end point A of tapered part is retreated to a point C. Then, the gap material 4 is etched again by using the organic layer insulating film 6 as a mask. This etching is made until the lower end point B of tapered part reaches the upper part of the lower magnetic body 3. |
