| 摘要 |
PURPOSE:To increase an adhering speed of a target atom or a particle to a substrate, and also to improve a utilization efficiency of a target by generating a plasma of a high density in the whole area on the surface of the target, and confining it. CONSTITUTION:A line of magnetic force 22 of a magnet 10 of a target 1 side is set to as to go to a cathode 3, and a line of magnetic force 23 of a magnet 13 of a substrate 11 side is set so as to go to a substrate holder 12 side. A microwave from a microwave generating source 17 is led into a spatter chamber 12 through a waveguide 20. The microwave is made incident in parallel to the lines of magnetic force made by the magnets 10, 13, therefore, an atmosphere gas of a spatter chamber 19 is ionized, and it becomes a plasma state. The plasma is confined between the target 1 and the substrate 11 and becomes a high density state. When a voltage is applied between electrodes 3, 6, an ion in the plasma is accelerated and collides with the surface of the target 1. An atom or a particle which has been expelled is made to adhere to the surface of the substrate 11 and accumulated. |
