| 发明名称 |
DISCHARGE SYSTEM FOR PLASMA PROCESSING |
| 摘要 |
An apparatus (10) for the downstream etching of semiconductor devices (31) which utilizes internal electrodes (12, 18) while avoiding the formation of loosely bonded particles in the discharge chamber (26). |
| 申请公布号 |
DE3269040(D1) |
申请公布日期 |
1986.03.27 |
| 申请号 |
DE19823269040 |
申请日期 |
1982.03.31 |
| 申请人 |
THE PERKIN-ELMER CORPORATION |
发明人 |
REINBERG, ALAN R.;STEINBERG, GEORGE N. |
| 分类号 |
H01L21/302;H01J37/32;(IPC1-7):H01J37/32;H01L21/306 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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